Founded in 2009, the Beijing Research and Development Center is devoted to the development and fabrication of thin-film power-generation equipment, while it delivers cutting-edge technology and low-cost integrated production line solutions. The center was approved ISO 9001 Certification in 2009, and awarded the title of "High-tech Enterprise" by the Beijing Municipal Science & Technology Commission in 2010.
The main products of the center include PECVD, PVD and low pressure chemical vapor deposition (LPCVD) systems, as well as some specialized vacuum equipment. The center's 72 glass single-room PECVD equipment is the largest single PECVD system in the world, with a deposition area of 57 square meters. Since its establishment, the center has delivered PECVD and PVD systems to several photovoltaic manufacturers, with a cumulative annual capacity of about 2GW. The center’s equipment is mainly used for the production of silicon germanium, nanocrystalline silicon and CIGS thin film photovoltaics.